{"created":"2023-05-15T14:46:35.535568+00:00","id":10179,"links":{},"metadata":{"_buckets":{"deposit":"631f4f41-18e6-4d6c-bc7f-be72c60035f7"},"_deposit":{"created_by":11,"id":"10179","owners":[11],"pid":{"revision_id":0,"type":"depid","value":"10179"},"status":"published"},"_oai":{"id":"oai:ksu.repo.nii.ac.jp:00010179","sets":["14:226:985"]},"author_link":["22285"],"control_number":"10179","item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2018-07-31","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"50","bibliographicPageStart":"43","bibliographicVolumeNumber":"13","bibliographic_titles":[{"bibliographic_title":"京都産業大学総合学術研究所所報"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"ここ数年，トポロジカル絶縁体の実験研究は非常にさかんに行われてきた。この論文では，トポロジカル絶縁体で最初に見出された三元系であるタリウム系カルコゲナイドの薄膜作製を試みたのでその第一歩について報告する。","subitem_description_type":"Abstract"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"京都産業大学総合学術研究所"}]},"item_10002_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11879037","subitem_source_identifier_type":"NCID"}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1348-8465","subitem_source_identifier_type":"PISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"瀬川, 耕司","creatorNameLang":"ja"},{"creatorName":"SEGAWA, Kouji","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-08-01"}],"displaytype":"detail","filename":"KSUSGKS_13_43.pdf","filesize":[{"value":"346.1 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KSUSGKS_13_43.pdf","url":"https://ksu.repo.nii.ac.jp/record/10179/files/KSUSGKS_13_43.pdf"},"version_id":"a15bb465-2e3b-4631-9d7d-51f3689dc723"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"トポロジカル絶縁体","subitem_subject_scheme":"Other"},{"subitem_subject":"薄膜作製","subitem_subject_scheme":"Other"},{"subitem_subject":"スパッタリング法","subitem_subject_scheme":"Other"},{"subitem_subject":"半導体","subitem_subject_scheme":"Other"},{"subitem_subject":"カルコゲナイド","subitem_subject_scheme":"Other"},{"subitem_subject":"Topological insulator","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Thin-film growth","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Sputtering method","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Semiconductors","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Chalcogenides","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"タリウム系トポロジカル絶縁体の薄膜作製の試行","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"タリウム系トポロジカル絶縁体の薄膜作製の試行","subitem_title_language":"ja"},{"subitem_title":"Thin-film growth of a Tl-based ternary topological insulator","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"11","path":["985"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2018-08-01"},"publish_date":"2018-08-01","publish_status":"0","recid":"10179","relation_version_is_last":true,"title":["タリウム系トポロジカル絶縁体の薄膜作製の試行"],"weko_creator_id":"11","weko_shared_id":-1},"updated":"2023-08-31T05:32:17.585042+00:00"}